Glass Wafer


 FOCtek Glass Wafer:

* High Volume Double Side Polishing Capacity
 
* Large Coating Machine up to 1.8m Chamfer
 
* High Cost Efficiency for volume production
 

Glass Wafer can be used for:

* 3D imaging and sensing
 
* Wafer-level package
 
* Encapsulated glass carrier wafer
 
* MEMS
 
* Microdisplay
 
* Microfluidic technology

    Specification parameter

Product

FusedWindow/Wafer
Material Fused Silica/Optical Glass/ Silicon
Dimension(mm) 100mm/150mm/200mm/300mm
Thickness (mm) 0.2mm(100/150mm),0.3mm(200/300mm)
Tolerance (mm) +/- 0.02mm (Commercial),  +/- 0.002mm(Precision)
Surface Quality 40-20 (Commercial), 10-5 (Precision)

Surface Figure or Transmitted Wavefront

≤ 0.1 waves PV (per 25.4mm @ 632.8nm)

 

 

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